A type of polycrystalline semiconductor rectifying element. When a copper plate (electrolytic copper) is surface oxidized at about 1000°C, annealed at about 500°C, and then rapidly cooled, a black layer of copper oxide (II) CuO is formed on the surface. This CuO layer is removed to expose a layer of red copper oxide (I) Cu 2 O (also called cuprous oxide), and an electrode (anode) is made by spraying a fusible alloy on it. The copper on the substrate is used as the cathode. This rectifying element utilizes the rectifying action between copper and copper oxide (I), and the forward current flows from the copper oxide to the copper. Source: Heibonsha World Encyclopedia, 2nd Edition Information |
多結晶半導体整流素子の一つ。銅板(電気銅)を約1000℃で表面酸化させ,約500℃で焼きなまし,次いで急冷させると,表面に黒色の酸化銅(II)CuOの層ができる。このCuO層を取り除いて赤色の酸化銅(I)Cu2O(亜酸化銅ともいう)の層を露出させ,易融合金を吹き付けるなどして電極(陽極)を作る。基板の銅を陰極にする。この銅と酸化銅(I)との間の整流作用を利用した整流素子で,酸化銅から銅へ流れるのが順電流である。
出典 株式会社平凡社世界大百科事典 第2版について 情報 |
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