...This process therefore takes a relatively long time. High temperature holding for carburizing and decarburizing steel, and high temperature holding for doping impurities into silicon for semiconductor devices are also intended for the purpose of diffusion, and are called diffusion annealing in these cases. When impurities are added by ion implantation, semiconductor devices are annealed to eliminate lattice defects, and the English concept is almost the same as annealing. ... *Some of the terminology that refers to "diffusion annealing" is listed below. Source | Heibonsha World Encyclopedia 2nd Edition | Information |
…したがってこの処理には比較的長い時間を要する。鋼の浸炭,脱炭のための高温保持や,半導体素子用ケイ素に不純物を添加するための高温保持なども拡散を目的とするものであり,これらの場合は拡散焼きなましと呼ばれる。イオン打込みによって不純物を添加したときなど,半導体素子には格子欠陥を消滅させるためのアニールannealがなされるが,この英語の概念は焼きなましとほとんど同じである。… ※「拡散焼きなまし」について言及している用語解説の一部を掲載しています。 出典|株式会社平凡社世界大百科事典 第2版について | 情報 |
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