Vacuum plating; vacuum evaporation coating

Japanese: 真空蒸着 - しんくうじょうちゃく（英語表記）vacuum plating; vacuum evaporation coating

A method of obtaining a thin film by attaching a thin film of another substance to the surface of an object as a substrate or by detaching it from the substrate. This thin film is called an evaporated film. The substrate is supported in a vacuum chamber, and a small amount of the substance to be attached is heated and evaporated to form a thin film on the substrate. The uniformity of the thin film, adhesion strength, and various properties of the thin film are determined by the cleanliness of the surface, temperature, degree of vacuum, evaporation rate, etc. It has a wide range of applications, including the production of surface coatings on glass and plastic products, and the production of thin films of high electrical resistance, semiconductors, and magnetic materials. Polycrystalline thin films can be produced when glass is used as a substrate, but single crystals such as ionic crystals and mica can be used as substrates to produce single crystal thin films by epitaxy. Amorphous metals can also be obtained depending on the evaporation conditions.

Source: Encyclopaedia Britannica Concise Encyclopedia About Encyclopaedia Britannica Concise Encyclopedia Information

Japanese:

物体の表面を基板として他の物質の薄膜を付着させたり，基板から離して薄膜を得る方法の1つ。この薄膜を蒸着膜という。真空容器内に基板を支え，付着させる物質の少量を加熱蒸発させて，基板に薄膜をつくる。薄膜の一様さ，付着の強さ，薄膜の種々の性質は表面の清浄度や温度，真空度，蒸着速度などにより左右される。ガラスやプラスチック製品の表面被膜生成，高電気抵抗，半導体，磁性体の薄膜生成など用途は広い。ガラスを基板とすると多結晶薄膜ができるが，イオン結晶，雲母などの単結晶を基板とするとエピタクシーによって単結晶薄膜ができる。また蒸着条件によっては金属の非晶質が得られる。

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